A macro layout verification apparatus for verifying a layout of a macro to be placed as a functional block on a semiconductor device. The apparatus includes: a unit, which assumes as a virtual wiring line, a wiring line that uses an unused intra-macro channel located adjacent to an intra-macro wiring line; a unit which calculates a parallel wiring length along which the virtual wiring line and the intra-macro wiring line run; and a unit which outputs information concerning the virtual wiring line when the parallel wiring length exceeds a reference value defined as a design rule.
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