首页> 外国专利> METHOD FOR RECYCLING A SUBSTRATE, LAMINATED WATER FABRICATING METHOD AND SUITABLE RECYCLED DONOR SUBSTRATE

METHOD FOR RECYCLING A SUBSTRATE, LAMINATED WATER FABRICATING METHOD AND SUITABLE RECYCLED DONOR SUBSTRATE

机译:基质的回收方法,层状水制造方法和合适的回收捐赠者基质

摘要

The invention relates to a method for recycling a substrate with a step-like residue in a first region of its surface, in particular along the edge of the substrate, which protrudes with respect to the surface of a remaining second region of the substrate, and wherein the first region comprises a modified zone, in particular an ion implanted zone, essentially in a plane corresponding to the plane of the surface of the remaining second region of the substrate and/or chamfered towards the edge of the substrate. To prevent the negative impact of contaminants in subsequent laminated wafer fabricating processes, the recycling method comprises a material removal step which is carried out such that the surface of the substrate in the first region is lying lower than the level of the modified zone before the material removal. The invention also relates to a laminated wafer fabricating method using the recycled substrate and to a recycled substrate in which the surface of a first region lies lower than the surface of the second region.
机译:本发明涉及一种用于回收具有在其表面的第一区域中,特别是沿着其边缘相对于该衬底的其余第二区域的表面突出的台阶状残留物的衬底的方法,以及其中第一区域在基本上对应于衬底的其余第二区域的表面的平面中和/或朝着衬底的边缘倒角的平面中包括改性区,特别是离子注入区。为了防止污染物在随后的叠层晶片制造过程中产生负面影响,回收方法包括材料去除步骤,该步骤被执行为使得第一区域中的衬底表面位于材料之前的改性区域的水平以下。去除。本发明还涉及使用回收的衬底的层压晶片制造方法,并且涉及其中第一区域的表面低于第二区域的表面的回收的衬底。

著录项

  • 公开/公告号US2010181653A1

    专利类型

  • 公开/公告日2010-07-22

    原文格式PDF

  • 申请/专利权人 CECILE AULNETTE;KHALID RADOUANE;

    申请/专利号US20080663254

  • 发明设计人 CECILE AULNETTE;KHALID RADOUANE;

    申请日2008-06-24

  • 分类号H01L29/02;B32B3/02;H01L21/762;H01L21/306;H01L21/265;

  • 国家 US

  • 入库时间 2022-08-21 18:55:06

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