首页> 外国专利> INTEGRATED CIRCUIT STRUCTURES AND FABRICATING METHODS THAT USE VOIDS IN THROUGH HOLES AS JOINING INTERFACES

INTEGRATED CIRCUIT STRUCTURES AND FABRICATING METHODS THAT USE VOIDS IN THROUGH HOLES AS JOINING INTERFACES

机译:使用通孔中的空隙作为连接界面的集成电路结构和制造方法

摘要

A void that is created in a conductive electrode in a through hole that extends through an integrated circuit substrate can be used as a joining interface. For example, an integrated circuit structure includes an integrated circuit substrate having a conductive pad on a first face thereof, and a through hole that extends through the integrated circuit substrate from a second face of the integrated circuit substrate that is opposite to the first face and through the pad. A conductive electrode is provided in the through hole that extends from the second face to the first face through and onto the pad. The conductive electrode includes a void therein adjacent the second face. The void includes a void opening adjacent the second face that defines inner walls of the conductive electrode. A conductive material is provided in the void that directly contacts the inner walls of the conductive electrode. Related fabrication methods are also disclosed.
机译:在导电电极中延伸穿过集成电路基板的通孔中产生的空隙可以用作接合界面。例如,集成电路结构包括:集成电路基板,在其第一面上具有导电焊盘;通孔,该通孔从集成电路基板的与第一面相对的第二面延伸穿过集成电路基板,该第二面与第一面相对。通过垫。导电电极设置在通孔中,该通孔从第二表面延伸穿过第一表面并到达焊盘。导电电极在其中邻近第二面包括空隙。空隙包括邻近第二面的空隙开口,该空隙限定导电电极的内壁。在空隙中提供了导电材料,其直接接触导电电极的内壁。还公开了相关的制造方法。

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