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HIGH TEMPERATURE BD DEVELOPMENT FOR MEMORY APPLICATIONS
HIGH TEMPERATURE BD DEVELOPMENT FOR MEMORY APPLICATIONS
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机译:用于存储器的高温BD开发
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摘要
A method and apparatus for depositing organosilicate dielectric layers having good adhesion properties and low dielectric constant. Embodiments are described in which layers are deposited at low temperature and at high temperature. The low temperature layers are generally post-treated, whereas the high temperature layers need no post treating. Adhesion of the layers is promoted by use of an initiation layer.
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