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Method for producing dielectric film, method for producing piezoelectric element, method for producing liquid-jet head, dielectric film, piezoelectric element, and liquid-jet apparatus
Method for producing dielectric film, method for producing piezoelectric element, method for producing liquid-jet head, dielectric film, piezoelectric element, and liquid-jet apparatus
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机译:电介质膜的制造方法,压电元件的制造方法,喷液头的制造方法,电介质膜,压电元件以及喷液装置
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摘要
A method for producing a dielectric film, comprising: a coating step of coating a colloidal solution containing an organometallic compound containing a metal constituting a dielectric film containing at least a lead component to form a dielectric precursor film; a drying step of drying the dielectric precursor film; a degreasing step of degreasing the dielectric precursor film; and a firing step of firing the dielectric precursor film to form a dielectric film, and wherein the drying step includes a first drying step of heating the dielectric precursor film to a temperature lower than the boiling point of a solvent, which is a main solvent of the material, and holding the dielectric precursor film at the temperature for a certain period of time to dry the dielectric precursor film, and a second drying step of drying the dielectric precursor film at a temperature in the range of 140° C., to 170° C., the degreasing step is performed at a degreasing temperature of 350° C. to 450° C. and at a heating-up rate of 15 [° C./sec] or higher, and the firing step is performed at a heating-up rate of 100 [° C./sec] to 150 [° C./sec].
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