首页> 外国专利> Method for improving yield of a layout and recording medium having the layout

Method for improving yield of a layout and recording medium having the layout

机译:用于提高布局的成品率的方法以及具有该布局的记录介质

摘要

A yield of a semiconductor layout may be improved by selecting a pattern that does not satisfy at least one of multiple rules within the layout, adding a margin to a predetermined value of the at least one of the rules associated with selected pattern, based on a ground rule and a recommended rule of each of the rules, calculating an overall fail rate of at least one of the rules that varies according to the addition of the margin, and determining an adjusted margin to be added based on the calculated overall fail rate.
机译:半导体布局的成品率可以通过以下方式来提高:通过选择不满足布局内的多个规则中的至少一个的图案,并基于与选择的图案相关联的至少一个规则的预定值增加余量。基本规则和每个规则的推荐规则,计算至少一个规则的总失败率,该规则根据保证金的增加而变化,并基于计算出的总失败率确定要增加的调整后保证金。

著录项

  • 公开/公告号US7818697B2

    专利类型

  • 公开/公告日2010-10-19

    原文格式PDF

  • 申请/专利权人 DAE HYUNG CHO;

    申请/专利号US20070822997

  • 发明设计人 DAE HYUNG CHO;

    申请日2007-07-11

  • 分类号G06F17/50;

  • 国家 US

  • 入库时间 2022-08-21 18:51:31

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号