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Lithographic patterning for sub-90nm with a multi-layered carbon-based hardmask
Lithographic patterning for sub-90nm with a multi-layered carbon-based hardmask
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机译:使用多层碳基硬掩模在90nm以下的光刻图案
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摘要
Multi-layered carbon-based hardmask and method to form the same. The multi-layered carbon-based hardmask includes at least top and bottom carbon-based hardmask layers having different refractive indexes. The top and bottom carbon-based hardmask layer thicknesses and refractive indexes are tuned so that the top carbon-based hardmask layer serves as an anti-reflective coating (ARC) layer.
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