首页> 外国专利> FAST P-I-N PHOTODETECTOR WITH HIGH RESPONSITIVITY

FAST P-I-N PHOTODETECTOR WITH HIGH RESPONSITIVITY

机译:快速响应式P-I-N光检测器

摘要

A lateral p-i-n photodetector is provided that includes an array of vertical semiconductor nanowires of a first conductivity type that are grown over a semiconductor substrate also of the first conductivity type. Each vertically grown semiconductor nanowires of the first conductivity type is surrounded by a thick epitaxial intrinsic semiconductor film. The gap between the now formed vertically grown semiconductor nanowires-intrinsic semiconductor film columns (comprised of the semiconductor nanowire core surrounded by intrinsic semiconductor film) is then filled by forming an epitaxial semiconductor material of a second conductivity type which is different from the first conductivity type. In a preferred embodiment, the vertically grown semiconductor nanowires of the first conductivity type are n+ silicon nanowires, the intrinsic epitaxial semiconductor layer is comprised of intrinsic epitaxial silicon, and the epitaxial semiconductor material of the second conductivity type is comprised of p+ silicon.
机译:提供横向p-i-n光电检测器,其包括在第一导电类型的半导体衬底上生长的第一导电类型的垂直半导体纳米线的阵列。第一导电类型的每个垂直生长的半导体纳米线被厚的外延本征半导体膜围绕。然后,通过形成不同于第一导电类型的第二导电类型的外延半导体材料来填充现在形成的垂直生长的半导体纳米线-本征半导体膜柱(由被本征半导体膜包围的半导体纳米线芯)之间的间隙。 。在优选的实施方式中,第一导电类型的垂直生长的半导体纳米线是n +硅纳米线,本征外延半导体层由本征外延硅构成,第二导电类型的外延半导体材料由p +硅构成。

著录项

  • 公开/公告号US2009305454A1

    专利类型

  • 公开/公告日2009-12-10

    原文格式PDF

  • 申请/专利权人 GUY M. COHEN;

    申请/专利号US20090541235

  • 发明设计人 GUY M. COHEN;

    申请日2009-08-14

  • 分类号H01L31/18;

  • 国家 US

  • 入库时间 2022-08-21 18:49:33

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