首页> 外国专利> The process and device for cleaning the substrate, including placing the substrate in the air water jet, is produced in a sprayer with air passages and waterways, where the volume of air is over 90, and its speed can be Or 80 m/s

The process and device for cleaning the substrate, including placing the substrate in the air water jet, is produced in a sprayer with air passages and waterways, where the volume of air is over 90, and its speed can be Or 80 m/s

机译:清洁衬底的过程和设备(包括将衬底放置在空气喷水器中)是在具有空气通道和水路的喷雾器中生产的,其中空气的体积超过90%,其速度可以为80 m / s

摘要

A process and a device for cleaning substrateIncludes a step of subjecting the substrate to a spray of Air - water spray generated using a medium comprising an air Passage and a Water,Where the air is greater than 90% in volume of spraying, Air Speed is greater than 80 m / s and the Air surrounding the passage of water.
机译:清洁基材的方法和装置包括以下步骤:使基材经受空气喷雾-使用包含空气通道和水的介质产生的水喷雾,其中空气的喷雾体积大于90%,大于80 m / s且空气环绕水的通道。

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