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METHOD FOR PRODUCING HETEROCONTACT HAVING DOUBLE BUFFER LAYER COMPRISING AT LEAST ZNO AND HETEROCONTACT HAVING DOUBLE BUFFER LAYER

机译:具有至少Zno的双缓冲层和具有双缓冲层的非接触异质性的制造方法

摘要

A method for producing a heterocontact, which has a double buffer layer that is free from phase shift and comprises at least ZnO, between an active chalcogenide-based semiconductor layer and a ZnO window contact layer is to be provided, which comprises no wet-chemical process steps and in particular fits in an inline production process for CIS thin-film solar arrays, while not requiring the use of CdS for the buffer layer and forms no excess CuS on the surface. The solution according to the invention provides for the production of a direct heterocontact between a chalcogenide-based semiconductor layer and a ZnO window contact layer by means of a MOMBE method, said heterocontact comprises a buffer layer made of ZnX, where X = S, Se, Te, and ZnO, made of two partial layers free from phase shift.
机译:提供一种用于在有源硫族化物基半导体层和ZnO窗口接触层之间制造具有无相移且至少包含ZnO的双缓冲层的异质接触的方法,该方法不包括湿化学剂该工艺步骤尤其适用于CIS薄膜太阳能电池阵列的在线生产工艺,而无需将CdS用于缓冲层并且在表面上不形成过量的CuS。根据本发明的解决方案通过MOMBE方法在基于硫属化物的半导体层和ZnO窗口接触层之间产生直接的异质接触,所述异质接触包括由ZnX制成的缓冲层,其中X = S,Se ,Te和ZnO由两个没有相移的部分层组成。

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