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VIA FIRST PLUS VIA LAST TECHNIQUE FOR IC INTERCONNECT

机译:通过VIA FIRST PLUS和VIA用于集成电路互连的最新技术

摘要

A multi-tiered IC device contains a first die including a substrate with a first and second set of vias. The first set of vias extends from one side of the substrate, and the second set of vias extend from an opposite side of the substrate. Both sets of vias are coupled together. The first set of vias are physically smaller than the second set of vias. The first set of vias are produced prior to circuitry on the die, and the second set of vias are produced after circuitry on the die. A second die having a set of interconnects is stacked relative to the first die in which the interconnects couple to the first set of vias.
机译:多层IC器件包括第一管芯,该第一管芯包括具有第一和第二组通孔的衬底。第一组通孔从衬底的一侧延伸,而第二组通孔从衬底的相对侧延伸。两组通孔都耦合在一起。第一组通孔在物理上小于第二组通孔。第一组通孔是在芯片上进行电路布线之前制作的,而第二组通孔是在芯片上进行电路布线之后制作的。具有一组互连的第二管芯相对于第一管芯堆叠,其中,互连耦接到第一组通孔。

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