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PARALLEL DISPLACEMENT MECHANISM AND METHOD FOR MANUFACTURING PARALLEL DISPLACEMENT MECHANISM

机译:平行位移机理及制造平行位移机理的方法

摘要

Provided is a parallel displacement mechanism wherein a displacement section, which is formed by laminating a first layer on the upper surface of an intermediate layer and laminating a second layer on the lower surface of the intermediate layer, is connected to a supporting section formed in the same manner, by means of a first beam formed of the first layer and a second beam formed of the second layer. The displacement section is configured to be displaced in parallel in the laminating direction of the first layer, the intermediate layer and the second layer. Thus, in the parallel displacement mechanism, tilts and positional shifts of an optical component can be suppressed, a fine and highly accurate parallel displacement can be made, and a large displacement can be obtained with a small drive power. A method for manufacturing the parallel displacement mechanism is also provided.
机译:提供一种平行位移机构,其中通过在中间层的上表面上层压第一层并在中间层的下表面上层压第二层而形成的位移部分与形成在中间层中的支撑部分连接。同样,通过由第一层形成的第一光束和由第二层形成的第二光束。位移部构造成在第一层,中间层和第二层的层叠方向上平行地位移。因此,在平行位移机构中,可以抑制光学部件的倾斜和位置偏移,可以进行精细且高精度的平行位移,并且可以以较小的驱动力获得较大的位移。还提供了一种用于制造平行位移机构的方法。

著录项

  • 公开/公告号WO2010101023A1

    专利类型

  • 公开/公告日2010-09-10

    原文格式PDF

  • 申请/专利权人 KONICA MINOLTA HOLDINGS INC.;MATSUDA SHINYA;

    申请/专利号WO2010JP52423

  • 发明设计人 MATSUDA SHINYA;

    申请日2010-02-18

  • 分类号B81B3/00;B81C1/00;G02B7/04;G02B26/06;G02B26/08;

  • 国家 WO

  • 入库时间 2022-08-21 18:36:24

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