NANO IMPRINT BLANKMASK, NANO IMPRINT MASTER AND IT'S MANUFACTURING METHODS

摘要

PURPOSE: A nanoimprint blankmask, nanoimprint master and its manufacturing methods are provided to make a complex of a process simple by using a blankmask for nanoimprint lithography and providing a nanoimprint stamp. CONSTITUTION: In a nanoimprint blankmask, nanoimprint master and its manufacturing methods, a nanoimprint(2) and a resist film(3) are successively laminated on the blank-mask for a nanoimprint on a transparent substrate(1). The thickness of a nanoimprint is 10,000~50,000, and is manufactured through a wet etching. The grain size of nanoimprint is bellow 50nm. The nanoimprint is composed a single/multi-layer.