首页> 外国专利> NITRIDE LIGHT EMITTING DEVICE HAVING INN QUANTUM DOT CAPPING LAYER, CAPABLE OF REDUCING A FORWARD DRIVING VOLTAGE BY IMPROVING OHMIC CHARACTERISTICS

NITRIDE LIGHT EMITTING DEVICE HAVING INN QUANTUM DOT CAPPING LAYER, CAPABLE OF REDUCING A FORWARD DRIVING VOLTAGE BY IMPROVING OHMIC CHARACTERISTICS

机译:具有INN量子点覆盖层的氮化物发光器件,能够通过改善欧姆特性来降低正向驱动电压

摘要

PURPOSE: A nitride light emitting device having inn quantum dot capping layer is provided to decrease a forward operating voltage by forming a capping layer between a P-type electrode and an Mg -doped P-type semiconductor layer.;CONSTITUTION: The emitting device(10) includes the low temperature buffer layer(12), N type nitride semiconductor layer(13), the active layer(15), the P-type nitride semiconductor layer(16) and the P-type transparent electrode successively formed on the substrate(11). A nitride semiconductor includes the Al(x) In(y) Ga(z) N composition. A P-type nitride semiconductor layer is formed with a Mg-doped P-type Al(x) In(y) Ga(z) N. A P-type pad electrode(19) is formed on a P-type electrode. An N-type pad electrode is arranged on the N-type nitride semiconductor layer.;COPYRIGHT KIPO 2010
机译:用途:提供一种具有inn量子点覆盖层的氮化物发光器件,以通过在P型电极和掺Mg的P型半导体层之间形成覆盖层来降低正向工作电压。 10)包括依次形成在基板上的低温缓冲层(12),N型氮化物半导体层(13),活性层(15),P型氮化物半导体层(16)和P型透明电极(11)。氮化物半导体包括Al(x)In(y)Ga(z)N成分。由掺杂有Mg的P型Al(x)In(y)Ga(z)N形成P型氮化物半导体层。在P型电极上形成P型焊盘电极(19)。 N型焊盘电极排列在N型氮化物半导体层上。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20090129038A

    专利类型

  • 公开/公告日2009-12-16

    原文格式PDF

  • 申请/专利权人 SEMICON LIGHT CO. LTD.;

    申请/专利号KR20080055093

  • 发明设计人 YOO TAE KYOUNG;

    申请日2008-06-12

  • 分类号H01L33/00;

  • 国家 KR

  • 入库时间 2022-08-21 18:33:53

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