首页> 外国专利> FERROELECTRIC MATERIAL, A FERROELECTRIC MEMORY DEVICE WITH EXCELLENT DATA HOLDING CHARACTERISTIC USING THE SAME, AN ELECTRIC TRANSISTOR AND MANUFACTURING METHOD THEREOF

FERROELECTRIC MATERIAL, A FERROELECTRIC MEMORY DEVICE WITH EXCELLENT DATA HOLDING CHARACTERISTIC USING THE SAME, AN ELECTRIC TRANSISTOR AND MANUFACTURING METHOD THEREOF

机译:铁电材料,具有使用该数据的优异数据保持特性的铁电存储器,其电晶体管及其制造方法

摘要

PURPOSE: A ferroelectric material is provided to form a ferroelectric material layer using a spin coating method or screen printing and to form a ferroelectric layer wit excellent data holding characteristic because the formation temperature of the ferroelectric layer approximately downs 200 deg.C or less.;CONSTITUTION: A ferroelectric material comprises a mixture of organic ferroelectric material and metal. The ferroelectric memory device comprises a substrate(1), source and drain regions(2,3) which are formed at a certain region of the substrate; a channel(4) formed between source and drain regions; a ferroelectric layer(40) formed at a part corresponding to the channel region on a semiconductor substrate; source electrode(6), and drain electrode(7) which are respectively formed on the source and drain regions and organic ferroelectric layer.;COPYRIGHT KIPO 2010
机译:用途:提供铁电材料以使用旋涂法或丝网印刷形成铁电材料层,并形成具有优异的数据保持特性的铁电层,这是因为铁电层的形成温度大约下降200℃或更低。组成:铁电材料包括有机铁电材料和金属的混合物。该铁电存储器件包括衬底(1),形成在衬底的特定区域上的源区和漏区(2,3);在源极和漏极区域之间形成的沟道(4);在对应于半导体衬底上的沟道区的部分上形成铁电层(40);源电极(6)和漏电极(7)分别形成在源区和漏区以及有机铁电层上。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20090129838A

    专利类型

  • 公开/公告日2009-12-17

    原文格式PDF

  • 申请/专利号KR20080055949

  • 发明设计人 PARK BYUNG EUN;

    申请日2008-06-13

  • 分类号H01B3/02;H01L21/208;H01L27/105;

  • 国家 KR

  • 入库时间 2022-08-21 18:33:49

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