LITHOGRAPHY PROJECTION APPARATUS CAPABLE OF REMOVING THERMAL GRADIENT GENERATED AT FINAL ELEMENT OF PROJECTION SYSTEM, AND PREPARATION METHOD OF DEVICE

摘要

PURPOSE: A lithography projection apparatus, and a method for preparing a device are provided to form a hydrophobic coating on the external surface of the final element of a projection system, thereby controlling and/or reducing the thermal gradient of the final element.;CONSTITUTION: A lithography projection apparatus comprises a projection system(PS) which has the final element and projects patterned beam on a substrate(W); a liquid handling system which supplies the immersion liquid to the space between the substrate and the final element; a plurality of heating and/or cooling devices which are thermally combined in the final element, and are independently controllable, and are separated one another; and a control system which is combined with the plurality of heating and/or cooling devices, and controls the plurality of heating and/or cooling devices separately so as to maintain the desired space temperature profile of the final element.;COPYRIGHT KIPO 2010