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TRIPLE SHOWERHEAD AND ALD APPARATUS INCLUDING THE TRIPLE SHOWERHEAD

机译:三头顶和ALD装置,包括三头顶

摘要

PURPOSE: A triple showerhead with an ALD(Atomic Layer Deposition) apparatus is provided to prevent the mixture of a first source and a second source. CONSTITUTION: A baffle(180) has a first fluid path(184a) and a second fluid path. The first source and the second source flow through first and 2 flow path respectively. The entrance of the first fluid path is formed on the first side surface of the baffle. An entrance of a second fluid path is formed on the second side of the baffle. A supply plate(140) surrounds a first, a second, a third, a fourth side. The feed plate has a first buffer(144a) and a second buffer(144b).
机译:目的:提供一种带有ALD(原子层沉积)设备的三喷头,以防止第一源和第二源的混合。构成:挡板(180)具有第一流体路径(184a)和第二流体路径。第一源和第二源分别流过第一和第二流动路径。第一流体路径的入口形成在挡板的第一侧面上。第二流体路径的入口形成在挡板的第二侧上。供给板(140)围绕第一,第二,第三,第四侧面。进料板具有第一缓冲器(144a)和第二缓冲器(144b)。

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