GERMANIUM FILM MANUFACTURING METHOD USING ORGANIC GERMANIUM COMPOUND, CAPABLE OF UTILIZING REDUCTION GAS AS REACTION GAS

摘要

PURPOSE: A germanium film manufacturing method using organic germanium compound is provided to manufacture a film with uniform thickness without pores.;CONSTITUTION: A germanium film manufacturing method using organic germanium compound comprises the following steps. A germanium thin film is manufactured on a substrate through a chemistry gas deposition method or an atomic layer deposition method. The organic germanium compound is used as germanium source and reduction gas is used as the reaction gas. The chemistry gas deposition method comprises the following steps. The organic germanium compound and the reduction gas are simultaneously injected into a reactor. The germanium source which is not absorbed and the by-product are removed from the reactor. The atomic layer deposition method comprises the following steps. The germanium compound is injected into the reactor and is absorbed on the substrate(S110). The germanium source and the by-product are removed from the reactor(S120). The reduction gas is injected and reacted(S130). The by-product is eliminated from the reactor after the reaction(S140).;COPYRIGHT KIPO 2010