SHOWERHEAD AND A CHEMICAL VAPOR DEPOSITION APPARATUS HAVING THE SAME, CAPABLE OF GENERATING A FLOWING FIELD IN WHICH A REACTION GAS IS FORMED AS A SPIRAL VORTEX

摘要

PURPOSE: A showerhead and a chemical vapor deposition apparatus having the same are provided to reduce the consumption of reaction gas by minimizing the mixed length of the reaction gas.;CONSTITUTION: A reaction chamber(110) has a susceptor(120). The head(200) comprises a reservoir(R). In this case, reservoir stores inflowing reaction gas(G). A head supplies the reaction gas to a reaction chamber. An injection nozzle(215) is formed with a plurality of heads. The spray nozzle is inclined by a certain angle. In this case, the spray nozzle makes the reaction gas form the reaction chamber a spiral vortex.;COPYRIGHT KIPO 2010