首页> 外国专利> THINNED SEMICONDUCTOR WAFER FORMING A RING SUPPORTING STRUCTURE, AND A METHOD OF THINNING A SEMICONDUCTOR WAFER

THINNED SEMICONDUCTOR WAFER FORMING A RING SUPPORTING STRUCTURE, AND A METHOD OF THINNING A SEMICONDUCTOR WAFER

机译:形成环支撑结构的薄型半导体晶片,以及薄型化半导体晶片的方法

摘要

PURPOSE: A thinned semiconductor wafer and a method of thinning a semiconductor wafer are provided to form a ring supporting structure suitable for thinning a wafer and reduce operation cost by forming the ring supporting structure including a lip which includes an edge making the surface of the wafer non-vertically.;CONSTITUTION: A thinned semiconductor wafer and a method of thinning a semiconductor wafer comprise a grinder(200), and a grinding wheel(202). The grinder is programmed in order to move the grinding wheel. The grinding wheel rotates at the direction marked by an arrow(204) while the surface of the semiconductor wafer(150) is pressurized. The boundary of a cavity(166) is set by a step edge(158) and a boundary surface(170).;COPYRIGHT KIPO 2010
机译:用途:提供一种薄化的半导体晶片和使半导体晶片变薄的方法,以形成适于变薄晶片的环形支撑结构,并通过形成包括具有边缘的唇部的环形支撑结构来降低操作成本,该唇部包括使晶片表面成为边缘的边缘组成:减薄的半导体晶片和减薄半导体晶片的方法包括研磨机(200)和砂轮(202)。磨床已编程,以便移动砂轮。在对半导体晶片(150)的表面加压的同时,砂轮沿箭头(204)所示的方向旋转。空腔(166)的边界由台阶边缘(158)和边界表面(170)设置。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100029699A

    专利类型

  • 公开/公告日2010-03-17

    原文格式PDF

  • 申请/专利权人 SEMICONDUCTOR COMPONENTS INDUSTRIES L.L.C.;

    申请/专利号KR20090077418

  • 发明设计人 SEDDON MICHAEL J.;

    申请日2009-08-21

  • 分类号H01L21/302;

  • 国家 KR

  • 入库时间 2022-08-21 18:33:09

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