首页> 外国专利> APPARATUS FOR SEPARATING A GAS-LIQUID AND AN APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME, CAPABLE OF SEPARATING A PROCESS SOLUTION AND A GAS FROM THE GAS-LIQUID

APPARATUS FOR SEPARATING A GAS-LIQUID AND AN APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME, CAPABLE OF SEPARATING A PROCESS SOLUTION AND A GAS FROM THE GAS-LIQUID

机译:用于分离气液的设备和用于处理包括相同物质的基质的设备,其能够从气液中分离过程溶液和气体

摘要

PURPOSE: An apparatus for separating a gas-liquid and an apparatus for processing a substrate including the same are provided to protect a vacuum pump from damaging due to a process solution by arranging the apparatus for separating gas-liquid between a process chamber and the vacuum pump.;CONSTITUTION: An inlet(111) through which a gas-liquid(GL) is injected is formed on the upper side of a separation box(110). A filter unit(120) is arranged in the lower part of the inlet and filters liquid(L) from the GL. An exhaust pipe(130) is formed on the lateral side of the outlet(136) to exhaust gas(G) from the GL. A drain pipe(140) is connected to the lower side of the separation box and drains the liquid which is filtered by the filter unit.;COPYRIGHT KIPO 2010
机译:目的:提供一种用于分离气液的设备和一种用于处理包括该气液的基板的设备,以通过在处理室和真空之间布置用于分离气液的设备来保护真空泵免受工艺溶液的损害。组成:在分离箱(110)的上侧形成一个入口(111),通过该入口注入气液(GL)。在入口的下部布置有过滤器单元(120),并从GL中过滤液体(L)。排气管(130)形成在出口(136)的侧面上,以从GL排出气体(G)。排污管(140)连接到分离箱的下侧,排出被过滤器单元过滤的液体。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100030288A

    专利类型

  • 公开/公告日2010-03-18

    原文格式PDF

  • 申请/专利权人 SEMES CO. LTD.;

    申请/专利号KR20080089171

  • 发明设计人 KIM JEONG SEON;

    申请日2008-09-10

  • 分类号H01L21/02;

  • 国家 KR

  • 入库时间 2022-08-21 18:33:06

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