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APPARATUS FOR SEPARATING A GAS-LIQUID AND AN APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME, CAPABLE OF SEPARATING A PROCESS SOLUTION AND A GAS FROM THE GAS-LIQUID
APPARATUS FOR SEPARATING A GAS-LIQUID AND AN APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME, CAPABLE OF SEPARATING A PROCESS SOLUTION AND A GAS FROM THE GAS-LIQUID
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机译:用于分离气液的设备和用于处理包括相同物质的基质的设备,其能够从气液中分离过程溶液和气体
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摘要
PURPOSE: An apparatus for separating a gas-liquid and an apparatus for processing a substrate including the same are provided to protect a vacuum pump from damaging due to a process solution by arranging the apparatus for separating gas-liquid between a process chamber and the vacuum pump.;CONSTITUTION: An inlet(111) through which a gas-liquid(GL) is injected is formed on the upper side of a separation box(110). A filter unit(120) is arranged in the lower part of the inlet and filters liquid(L) from the GL. An exhaust pipe(130) is formed on the lateral side of the outlet(136) to exhaust gas(G) from the GL. A drain pipe(140) is connected to the lower side of the separation box and drains the liquid which is filtered by the filter unit.;COPYRIGHT KIPO 2010
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