EVALUATION METHOD AND EXPOSURE APPARATUS FOR REVISING OPTICAL PERFORMANCE OF PROJECTION OPTICAL SYSTEM TO HIGH PRECISION

摘要

PURPOSE: An evaluation method and exposure apparatus reduce the error caused by the large-size of disk. The optical performance of the projection optical system is evaluated as the high precision.;CONSTITUTION: The exposure apparatus comprises the disk stage(20), and the first drive machinery(21) and the second driver tool(23). The disk for evaluation disk and exposure is loaded in the disk stage. The first drive machinery runs the disk stage to the scanning direction first direction. The second driver tool runs for evaluation disk on the disk stage the first direction and the second meeting at right angle.;COPYRIGHT KIPO 2010