POSITIVE RESIST COMPOSITION WHICH CONTAINS A SUBSTRATE COMPONENT HAVING A SPECIFIC POLYMER AND AN ACID GENERATOR HAVING A SPECIFIC ANION PART AND A METHOD FOR FORMING A RESIST PATTERN USING THE SAME

摘要

PURPOSE: A positive resist composition and a method for forming a resist pattern using the composition are provided to obtain excellent shape of the resist pattern.;CONSTITUTION: A positive resist composition comprises: a substrate component in which the solubility about alkaline developing solution is enlarged with the action of acid; and an acid generator component which has acidity through exposure. The substrate component comprises: a component(a0) marked as a chemical formula 1; a polymer having the component(a1) induced from esther acrylate with acidic dissociative dissolution inhibitor; and the acid generator having an anion part which the acid generator component is marked as X-Q1-Y1-SO^3.;COPYRIGHT KIPO 2010