CHEMICAL SUPPLY DEVICE, A CHEMICAL SOLUTION PROCESSING DEVICE INCLUDING THE SAME, AND A CHEMICAL SOLUTION SUPPLYING METHOD THEREOF, CAPABLE OF SUPPRESSING THE DENSITY VARIATION OF A CHEMICAL SOLUTION

摘要

PURPOSE: A chemical supply device, a chemical solution processing device including the same, and a chemical solution supplying method thereof are provided to maximally suppress the density variation of a chemical solution by including a gas exhaust line on one side of a gas supply line even through a chemical solution storage tank is purged for a long time.;CONSTITUTION: An apparatus for supplying a chemical solution(100) includes a chemical solution supply line, a chemical solution storage tank(120), a chemical solution exhaust line, and a gas supply line. The chemical solution line supplies a chemical solution(10). The chemical solution storage tank receives and storage the chemical solution through the chemical supply line. The chemical solution exhaust line transfers the chemical solution storage in the chemical solution storage tank to an exhaust position. The gas supply line provides purge gas to the chemical solution storage tank. The gas supply line includes the gas exhaust line for exhausting the purge gas on one side.;COPYRIGHT KIPO 2010