SUBSTRATE PROCESSING DEVICE AND A METHOD FOR MAINTAINING THE SAME, CAPABLE OF EXHAUSTING THE DEVICE IN A MAINTENANCE OPERATION

摘要

PURPOSE: A substrate processing device and a method for maintaining the same are provided to improve work efficiency by reducing non-operation time of a system and maintenance time.;CONSTITUTION: A chamber(82) has an internal space. A processing unit is installed in the internal space of the chamber, is drawn out through one side of the chamber, and includes an exhaust line. An exhaust unit(400) is installed in the chamber and includes a movable exhaust port. The movable exhaust port is connected to an exhaust line and moves according to the processing unit.;COPYRIGHT KIPO 2010