MANUFACTURING APPARATUS OF A SEMICONDUCTOR DEVICE AND A MANUFACTURING METHOD USING THE SAME, USING A QUARTZ CRYSTAL MICRO BALANCE FOR AN ETCHING, AN EVAPORATION OR A CLEANING END-POINT IN AN EVAPORATION, AND AN ETCHING OR A CLEANING PROCESS TO ELIMINATE A GENERATION FILM INSIDE A PROCESS CHAMBER

摘要

PURPOSE: A manufacturing apparatus of a semiconductor device and a manufacturing method using the same, using a quartz crystal micro balance for determining an etching, an evaporation or a cleaning end-point in an evaporation, an etching or a cleaning process are provided to determine a generation film eliminating end-point by monitoring the thickness variance of the generation film using a quartz installed inside a process chamber.;CONSTITUTION: A thin film is evaporated on the upper side of a wafer by an evaporation process. The inside of a processing chamber is cleaned. The thickness variance of a generation film is monitored using quartz installed inside the processing chamber. The generation film eliminating end-point is determined based on monitoring. The elimination of the generation film is processed by a remote plasma cleaning device(100).;COPYRIGHT KIPO 2010