STAGE UNIT FOR A PROBE STATION AND AN APPARATUS FOR TESTING A WAFER INCLUDING THE SAME, CAPABLE OF MAINTAINING THE TEMPERATURE OF A CHUCK WHICH SUPPORTS A WAFER

摘要

PURPOSE: A stage unit for a probe station and an apparatus for testing a wafer including the same are provided to suppress inflow of a coolant of a liquid state into a chuck, thereby reducing difference of a temperature change inside the chuck.;CONSTITUTION: A chuck(110) forms an oil path and supports a wafer. A supply line(121) and a discharge line(123) input or discharge a coolant into or from a chuck. The supply line and the discharge line are connected to cool the chuck at the first temperature. A heating unit(150) heats the chuck. When the heating unit changes the temperature of the chuck into the second temperature higher than the first temperature, a heating block(130) heats a coolant in the supply line and vaporizes the coolant.;COPYRIGHT KIPO 2010