MICRO LENS MASK OF AN IMAGE SENSOR, CAPABLE OF PREVENTING A SPACE BETWEEN MICRO LENSES FROM WIDENING AND A METHOD FOR FORMING A MICRO LENS

摘要

PURPOSE: A micro lens mask of an image sensor and a method for forming a micro lens are provided to remove a photoresist for a micro lens on a metal pad through one exposure process by strongly controlling the intensity of light in an exposure process.;CONSTITUTION: A photoresist layer for a micro lens is formed on a semiconductor substrate. A micro lens mask(600) comprises a plurality of patterns which makes the pentagonal or hexagonal array so that each side adjoins each other. The micro lens mask is formed on the photoresist layer for the micro lens. An interval between patterns is 0.045 to 0.055 um. A micro lens is formed by reflowing the patterned photoresist layer for the micro lens.;COPYRIGHT KIPO 2010