首页> 外国专利> NEGATIVE PHOTORESIST RESIN COMPOSITION CONTAINING A MODIFIED EPOXY ACRYLATE RESIN FOR FORMING A PDP BARRIER RIB, AND A PLASMA DISPLAY PANEL INCLUDING THE BARRIER RIB

NEGATIVE PHOTORESIST RESIN COMPOSITION CONTAINING A MODIFIED EPOXY ACRYLATE RESIN FOR FORMING A PDP BARRIER RIB, AND A PLASMA DISPLAY PANEL INCLUDING THE BARRIER RIB

机译:负性光致抗蚀剂树脂组合物,其中包含改性的丙烯酸丙烯酸酯树脂,用于形成PDP阻挡肋,以及包括阻挡肋的等离子显示屏。

摘要

PURPOSE: A negative photoresist resin composition for forming a PDP barrier rib, and a plasma display panel(PDP) including the barrier rib are provided to remove an unnecessary laminating process, and to prevent the reduction of the production efficiency.;CONSTITUTION: A negative photoresist resin composition for forming a PDP barrier rib is capable of forming the barrier rib at the coating thickness of 5~10 micrometers. The negative photoresist resin composition contains 50~60wt% of modified epoxy acrylate resin marked with chemical formula 1, 10~20wt% of radical polymerization initiator containing more than one photopolymerization initiator, 10~20wt% of monomer with a radical polymerizable double bond within a molecule, 1~2wt% of antifoaming agent, 1~2wt% of leveling agent, and 10~30wt% of solvent.;COPYRIGHT KIPO 2010
机译:目的:提供一种用于形成PDP隔墙的负性光刻胶树脂组合物,以及一种包括该隔墙的等离子体显示面板(PDP),以消除不必要的层压过程,并防止生产效率降低。用于形成PDP隔壁的光致抗蚀剂树脂组合物能够以5〜10微米的涂层厚度形成隔壁。负性光致抗蚀剂树脂组合物包含50〜60wt%的化学式1标记的改性环氧丙烯酸酯树脂,10〜20wt%的自由基聚合引发剂包含一种以上的光聚合引发剂,10〜20wt%的单体具有可自由基聚合的双键。分子,1〜2wt%的消泡剂,1〜2wt%的流平剂和10〜30wt%的溶剂。; COPYRIGHT KIPO 2010

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