首页> 外国专利> FREE-STANDING NANOPOROUS SILICA/CARBON HYBRID FILM WITH CRYSTALLINE SILICA IN NANOPORE WALLS, MANUFACTURING METHOD OF THE MATERIALS

FREE-STANDING NANOPOROUS SILICA/CARBON HYBRID FILM WITH CRYSTALLINE SILICA IN NANOPORE WALLS, MANUFACTURING METHOD OF THE MATERIALS

机译:纳米多孔墙体中的含二氧化硅的游离硅纳米碳/碳杂化物膜的制造方法

摘要

PURPOSE: A nanoporous silica/carbon hybrid thin film and a manufacturing method thereof are provided to obtain the nanoporous silica/carbon hybrid thin film including crystalline silica inside a micro pore wall, and a uniform pore arrangement. CONSTITUTION: A nanoporous silica/carbon hybrid thin film capable of standing independently uses a surfactant as a structure molding template, an alkali metal as a structure molding aid, and an inorganic material as a formation material for a micro pore wall. The formation of the thin film is performed by the self-assembly method. The thin film includes a silica or an organic-inorganic hybrid silica as a lead compound.
机译:用途:提供一种纳米多孔二氧化硅/碳杂化薄膜及其制造方法,以获得在微孔壁内包括结晶二氧化硅且孔排列均匀的纳米多孔二氧化硅/碳杂化薄膜。组成:能够独立站立的纳米多孔二氧化硅/碳杂化薄膜使用表面活性剂作为结构成型模板,使用碱金属作为结构成型助剂,并使用无机材料作为微孔壁的形成材料。薄膜的形成通过自组装方法进行。薄膜包括二氧化硅或有机-无机杂化二氧化硅作为铅化合物。

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