首页> 外国专利> OPTIMIZATION METHOD AND A LITHOGRAPHIC CELL THROUGH MINIMIZING VARIABLES IN A PROBABILITY MODEL OF A DOUBLE PATTERING

OPTIMIZATION METHOD AND A LITHOGRAPHIC CELL THROUGH MINIMIZING VARIABLES IN A PROBABILITY MODEL OF A DOUBLE PATTERING

机译:双模式概率模型中的最小化优化方法和通过最小化变量的光刻系统

摘要

PURPOSE: An optimization method and a lithographic cell is provided to optimize valuables by recording variables at each step and measuring the property of inter-feature in a double patterning, and then modeling a final feature.;CONSTITUTION: A first fabricating step is performed to have a first variable having at least more than 1. A first intermediate feature is measured as a first property. The second manufacturing step is performed to have a second variable having at least more than 1. A second intermediate feature is measured as a second property. The property of a final feature is modeled based on the first and the second variable having at least more than 1, and the final property is measured.;COPYRIGHT KIPO 2010
机译:目的:提供一种优化方法和光刻单元,以通过在每个步骤记录变量并在双重图案化中测量特征之间的特性,然后对最终特征建模来优化贵重物品。;组成:执行第一个制造步骤以具有至少大于1的第一变量。第一中间特征被测量为第一特性。执行第二制造步骤以具有至少大于1的第二变量。第二中间特征被测量为第二性质。根据第一个和第二个变量至少具有1以上的值对最终特征的属性进行建模,并测量最终属性。; COPYRIGHT KIPO 2010

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