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CMOS IMAGE SENSOR MANUFACTURING METHOD AND A CMOS IMAGE SENSOR THEREOF, CAPABLE OF REMOVING THE CAUSE OF THE LEAKAGE CURRENT
CMOS IMAGE SENSOR MANUFACTURING METHOD AND A CMOS IMAGE SENSOR THEREOF, CAPABLE OF REMOVING THE CAUSE OF THE LEAKAGE CURRENT
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机译:CMOS图像传感器的制造方法及其CMOS图像传感器,能够消除漏电流的原因
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摘要
PURPOSE: A CMOS(Complementary Metal Oxide Semiconductor) image sensor manufacturing method and a CMOS image sensor thereof are provided to increase the reliability of blue photo-diode formation by adding a process of tilt/twist to the low energy in ion implantation.;CONSTITUTION: A first pixel p-well(102) is formed by ion implantation into a first preset energy on an epitaxial layer(100) of the semiconductor substrate. A second pixel p-well is formed by ion implantation into a second preset energy on the epitaxial layer. A third pixel p-well is formed by ion implantation into a third preset energy on the epitaxial layer. A fourth p-well is formed by tilt and twist ion implantation into the first preset energy on the epitaxial layer.;COPYRIGHT KIPO 2010
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