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PREPARATION METHOD OF AL-INDUCED NANO-CRYSTALLINE SILICON INDUCED, CAPABLE OF CONTROLLING THE SIZE OF NONO-CRYSTAL THROUGH A HEAT TREATMENT
PREPARATION METHOD OF AL-INDUCED NANO-CRYSTALLINE SILICON INDUCED, CAPABLE OF CONTROLLING THE SIZE OF NONO-CRYSTAL THROUGH A HEAT TREATMENT
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机译:铝诱导的纳米晶硅的制备方法,可通过热处理来控制纳米晶的尺寸
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摘要
PURPOSE: A preparation method of al-induced nano-crystalline silicon induced is provided to easily control optical property, chemical property, and a physical property by manufacturing nano-crystalline silicon thin film under nitrogen atmosphere.;CONSTITUTION: A thin film is deposited on a silicon wafer by using a silicon target and an aluminum chip as a target material. The deposited thin film on wafer is anneal-processed to form a nano-crystal. The Si nano crystals is 1~20 nm. The aluminum chip is 2.5~10 weight% of the silicon target. A thermal process operates in the range of 400~1200 °C.;COPYRIGHT KIPO 2010
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