APPARATUS AND A METHOD FOR DRAINING THE CLEANING SOLUTION OF A CLEANING BATH, CAPABLE OF PREVENTING THE CLEANING BATH FROM DAMAGING DUE TO A PUMP

摘要

PURPOSE: An apparatus and a method for draining the cleaning solution of a cleaning bath are provided to improve the productivity of wafers by reducing a time for draining the cleaning solution to the outside of the cleaning bath.;CONSTITUTION: A pumping tube(250) is downwardly inserted to the upper side of a cleaning bath(210). A pump(260) drains a cleaning solution(220) to the outside of the cleaning bath using the pumping tube. The cleaning solution is free-fallen by opening the valve(240) of a draining pipe(230). The cleaning solution is compulsively drained using the pump, such that a draining time is highly reduced.;COPYRIGHT KIPO 2010