METHOD FOR FORMING A CONTACT HOLE USING A SPACER PATTERNING PROCESS, CAPABLE OF IMPROVING YIELD BY REDUCING THE NUMBER OF STEPS

摘要

PURPOSE: A method for forming a contact hole is provided to form a fine contact hole and simplify a process by using a spacer process when forming a fine pattern through lithography technique.;CONSTITUTION: A photosensitive film is coated on a layer formed on a semiconductor substrate after an anti-reflection layer is deposited. A lower anti-reflection layer is etched by using a first pattern(115) as a mask. The first pattern is formed by successively developing and exposing with first and second masks which are crossed. A second pattern is formed by anisotropically etching the first pattern after a spacer material(120) is coated on the first pattern. The lower layer is etched by using the second pattern as a barrier.;COPYRIGHT KIPO 2011