MICROMACHINING METHOD FOR SYNTHETIC QUARTZ GLASS SUBSTRATE WHICH ENABLES MICROMACHINING OF DIMENSIONAL TOLERANCE

摘要

PURPOSE: A micromachining method for synthetic quartz glass substrate is provided to enable long term etching without film peeling.;CONSTITUTION: A micromachining method for synthetic quartz glass substrate comprises: a step of forming at least one or more organic film layer to a masking portion; and a step of laminating a photoresist film. The organic film layer is formed by a compound of chemical formula 1 or silazane compound. In chemical formula 1, R is substituted or non-substituted linear, branch or cyclic alkyl group of 1-18 carbon, aryl group or aralkyl group of 6-18 carbon atoms, or unsaturated aliphatic hydrocarbon group of 2-18 carbon atoms; X is chlorine atom, methoxy group or ethoxy group; and n is 1-3 integer.;COPYRIGHT KIPO 2011