PURPOSE: A method for manufacturing a silica nanodot array is provided to form an inorganic nano structure with various forms used in the manufacture of a nano-sized device on a substrate. CONSTITUTION: A method for manufacturing a silica nanodot(5) array comprises the steps of: preparing a PS_x-b-PCS_z toluene solution by dissolving a PS_x-b-PCS_z double block copolymer in toluene; forming a titanium oxide substrate(2) by spin coating a titanium dioxide sol-gel solution on a silicon wafer; forming a PSx-b-PCSz thin film(1) having a nanohole structure by spin coating the PS_x-b-PCS_z toluene solution on the titanium oxide substrate; annealing the PSx-b-PCSz thin film by exposing the thin film to an acetone steam to dry the PSx-b-PCSz thin film; and irradiating ultraviolet rays on the surface of the dried PSx-b-PCSz thin film.
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