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METHOD OF FORMING LOW-DIELECTRIC-CONSTANT AMORPHOUS SILICA COATING AND LOW-DIELECTRIC-CONSTANT AMORPHOUS SILICA COATING OBTAINED BY THE METHOD
METHOD OF FORMING LOW-DIELECTRIC-CONSTANT AMORPHOUS SILICA COATING AND LOW-DIELECTRIC-CONSTANT AMORPHOUS SILICA COATING OBTAINED BY THE METHOD
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机译:形成低介电常数非晶态二氧化硅涂层的方法及采用该方法获得的低介电常数非晶态二氧化硅涂层的方法
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摘要
The present invention relates to an amorphous silica-based coating film with a low specific dielectric constant of 2.5 or below and the Young' s modulus of 6.0 GPa or more and having excellent hydrophobic property, and to a method of forming the same. A liquid composition containing a silicon compound obtained by hydrolyzing tetraalkyl ortho silicate (TAOS) and specific alkoxysilane (AS) in the presence of tetraalkyl ammonium hydroxide (TAAOH) is prepared. The liquid composition is then applied on a substrate, heated and cured to obtain a coating film. The coating film obtained as described has a smooth surface and also has specific micropores therein. IMAGE
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