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METHOD FOR PRODUCING HETEROGENEOUS PN junctions based on zinc oxide nanorods

机译:基于氧化锌纳米棒的异质PN结的制备方法

摘要

1. A process for preparing a heterogeneous pn transition based on zinc oxide nanorods, comprising growing by chemical vapor deposition of oriented vertically and at the base of interlocking zinc oxide nanorods on a conductive substrate of doped silicon, followed by precipitation of nickel oxide on them to form a continuous layer on the tips of the nanorods, wherein the deposition of nickel oxide on zinc oxide nanorods carried out at an angle to the longitudinal axis of the zinc oxide nanorods, which prevents precipitation of n oxide Ikel at the base of the nanorods. ! 2. A method according to claim 1, characterized in that the precipitation of nickel oxide is carried elektoronno-beam or magnetron sputtering. ! 3. A method according to claim 1, characterized in that as take-doped silicon with a resistivity silicon 0.1- 0.001 ohm-cm. ! 4. A method according to claim 1, characterized in that the ratio of length to diameter of the zinc oxide nanorods is 10-100. ! 5. A method according to claim 1, characterized in that the precipitation of nickel oxide on zinc oxide nanorods carried out at an angle to the longitudinal axis of the nanorods constituting 10-70 °.
机译:1.一种制备基于氧化锌纳米棒的非均质pn过渡的方法,其包括通过化学气相沉积在掺杂的硅的导电衬底上垂直取向并在互锁的氧化锌纳米棒的基部上生长,随后在其上沉积氧化镍。在纳米棒的尖端上形成连续层,其中氧化镍在氧化锌纳米棒上的沉积与氧化锌纳米棒的纵轴成一定角度,这可以防止n氧化物Ikel沉淀在纳米棒的底部。 。 ! 2.根据权利要求1所述的方法,其特征在于,氧化镍的沉淀是通过电电子束或磁控溅射进行的。 ! 3.根据权利要求1所述的方法,其特征在于,作为掺杂硅,其电阻率硅为0.1-0.001ohm-cm。 ! 4.根据权利要求1所述的方法,其特征在于,所述氧化锌纳米棒的长度与直径之比为10-100。 ! 5.根据权利要求1所述的方法,其特征在于,氧化镍在氧化锌纳米棒上的沉淀以相对于构成10-70°的纳米棒的纵轴的角度进行。

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