MoO₂ POWDER, METHODS OF MANUFACTURING PLATE FROM MoO₂ POWDER (THEIR VERSIONS), ELEMENT AND METHOD OF MANUFACTURING THIN FILM FROM IT, METHOD OF SPUTTERING WITH APPLICATION OF SAID PLATE

摘要

FIELD: chemistry.;SUBSTANCE: invention can be used in manufacturing organic light-emitting diodes, liquid-crystal displays, plasma display panel, thin-film solar cell and other electronic and semi-conductor devices. Claimed is element, including target of ionic dispersion, where said target includes processed MoO₂ plate of high purity. Method of such plate manufacturing includes isostatic pressing of component consisting of more than 99% of stoichiometric MoO₂ powder into workpiece, sintering of said workpiece under conditions of supporting more than 99% of MoO₂ stoichiometry and formation of plate which includes more than 99% of stoichiometric MoO₂. In other version of said plate manufacturing component, consisting of powder, which contains more than 99% of stoichiometric MoO₂, is processed under conditions of hot pressing with formation of plate. Method of thin film manufacturing includes stages of sputtering of plate, which contains more than 99% of stoichiometric MoO₂, removal of MoO₂ molecules from plate and application of MoO₂ molecules on substrate. Also claimed is MoO₂ powder and method of said plate sputtering with application of magnetron sputtering, pulse laser sputtering, ionic-beam sputtering, triode sputtering and their combination.;EFFECT: invention allows to increase work of output of electron of ionic sputtering target material in organic light-emitting diodes.;16 cl, 5 ex