Technological devices metrological SOFTWARE NANOTECHNOLOGY

摘要

The invention relates to mechanical engineering, and more particularly to metrological devices for nanotechnology.; The basis of the utility model on the technical problem which is to enable regulation of substrate scanning bandwidths within 3-9 Å.; The stated technical problem is solved in that the process device metrological support nanotechnology containing piezo mounted on a stationary base, a probe associated with the piezo, the substrate is mounted on a substrate holder, according to the proposed utility model, the probe is associated with a piezo through the adapter and the bimorph device is provided with additional probe means connected with the piezo bimorph and additional adapter, the primary and secondary bimorph adapted the possibility of an independent supply voltage to them, the probes are arranged relative to each other at an angle of about 90 °, and the distance between the probe tip and corresponds to the magnitude of the tunneling gap, and equals 3 to 9 Å.; The application of the metrological devices for nanotechnology enables measurements on a dielectric substrate with a variable width of the scanning band, using a system of main and additional probes with a tunnel gap therebetween unlike the single-probe system, which makes it impossible to adjust the scanning bandwidths.