首页> 外国专利> Electrode part for a plasma treatment before the direction, plasma treatment before the direction and the plasma treatment process

Electrode part for a plasma treatment before the direction, plasma treatment before the direction and the plasma treatment process

机译:方向前的等离子处理用电极部,方向前的等离子处理及等离子处理工艺

摘要

In a plasma treating apparatus, a ceramic porous substance having a three-dimensional network structure in which a frame portion formed of ceramic containing alumina is provided continuously like a three-dimensional network is used for the material of an electrode member for the plasma treating apparatus to be attached to the front surface of a gas supplying port of an electrode for plasma generation, and a gas for plasma generation is caused to pass through a hole portion formed irregularly in the three-dimensional network structure. Consequently, the distribution of the gas to be supplied is made uniform to prevent an abnormal discharge so that uniform etching having no variation can be carried out.
机译:在等离子体处理装置中,作为等离子体处理装置的电极构件的材料,使用具有三维网络结构的陶瓷多孔体,该三维多孔网络结构像三维网络那样连续地设置由含氧化铝的陶瓷形成的框架部。等离子体产生用气体附着在等离子体产生用电极的气体供给口的表面,使等离子体产生用气体通过在三维网状结构中不规则形成的孔部。因此,使供给的气体的分布均匀,以防止异常放电,从而可以进行没有变化的均匀蚀刻。

著录项

  • 公开/公告号DE10296978B4

    专利类型

  • 公开/公告日2010-03-04

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE2002196978

  • 发明设计人

    申请日2002-06-24

  • 分类号H01J37/32;H01L21/68;H05H1/46;C23F4/00;

  • 国家 DE

  • 入库时间 2022-08-21 18:29:09

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