Debris filter arrangement for plasma-based radiation source utilized for semiconductor lithography application, has plasma and buffer gas sections, where pressure gradient between sections is adjusted to order of magnitude

摘要

The arrangement (4) has intermediate sections (24, 25) arranged between plasma and buffer gas sections (21, 23). The plasma section, a collector section (22), the gas section and the intermediate sections are separated from one another by filter structures (41-44) e.g. flat lamella filters. The intermediate, plasma and collector sections have vacuum pumps (31-34), respectively outside of the gas section, such that pressure gradient between the gas and plasma sections is adjusted to an order of magnitude for reducing vacuum pressure at a location of plasma (1) to 1 Pascal or less than 1 Pascal.