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Actuator for the highly precise positioning and / or manipulation of components and for microlithography projection exposure system
Actuator for the highly precise positioning and / or manipulation of components and for microlithography projection exposure system
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机译:用于高精度定位和/或操纵组件以及微光刻投影曝光系统的执行器
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摘要
The actuator according to the invention (1) has a housing (2) and a, with respect to the housing (2) in the effective direction of the actuator movable rotor (3), wherein the actuator (1) has a feed unit, the at least temporarily with the rotor (3) in communication. The feed unit shows a at least one deformation unit (6) gives up, as well as at least one deformation (5) for the deformation of the deformation of a unit (6); the at least one deformation t (5) is suitable, the deformation unit (6) a perpendicular to the direction of action of the actuator (1) to deform in such a way that the total length of the deformation of a unit (6) in the direction of action as a result of the deformation changes. In addition, the invention relates to a projection exposure apparatus (310) for the half conductor lithography with an inventive actuator (1).
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