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Actuator for the highly precise positioning and / or manipulation of components and for microlithography projection exposure system

机译:用于高精度定位和/或操纵组件以及微光刻投影曝光系统的执行器

摘要

The actuator according to the invention (1) has a housing (2) and a, with respect to the housing (2) in the effective direction of the actuator movable rotor (3), wherein the actuator (1) has a feed unit, the at least temporarily with the rotor (3) in communication. The feed unit shows a at least one deformation unit (6) gives up, as well as at least one deformation (5) for the deformation of the deformation of a unit (6); the at least one deformation t (5) is suitable, the deformation unit (6) a perpendicular to the direction of action of the actuator (1) to deform in such a way that the total length of the deformation of a unit (6) in the direction of action as a result of the deformation changes. In addition, the invention relates to a projection exposure apparatus (310) for the half conductor lithography with an inventive actuator (1).
机译:根据本发明的致动器(1)具有壳体(2)和相对于壳体(2)沿致动器可动转子(3)的有效方向,其中致动器(1)具有进给单元,至少暂时与转子(3)连通。馈送单元示出了至少一个变形单元(6)放弃,以及至少一个变形(5)用于单元(6)的变形的变形;至少一个变形t(5)是合适的,变形单元(6)a垂直于致动器(1)的作用方向而变形,使得变形的总长度(6)在作用方向上由于变形而改变。另外,本发明涉及一种具有本发明的致动器(1)的用于半导体光刻的投影曝光设备(310)。

著录项

  • 公开/公告号DE102008034285A1

    专利类型

  • 公开/公告日2010-02-04

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE20081034285

  • 发明设计人

    申请日2008-07-22

  • 分类号G02B7/00;G03F7/20;G02B7/10;

  • 国家 DE

  • 入库时间 2022-08-21 18:28:53

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