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A method for producing monocrystalline piezoresistances and pressure sensor elements with such piezoresistors

机译:一种用于生产单晶压阻的方法和具有这种压阻的压力传感器元件

摘要

With the present invention, a method for producing monocrystalline piezoresistances in the surface of a monocrystalline silicon layer proposed, which, by an insulation layer against the surrounding substrate are electrically insulated and thus also in the high temperature range can be used for measuring.In accordance with the invention, first at least one doping in the resistor region of the silicon surface is introduced. Then, an electrical insulation (23) of the doped resistance zone (21) is generated against the adjacent silicon. For this purpose, there is at least one of the doped resistance zone (21), and below the doped resistance zone (21) extending region (23) of the silicon layer (10) etched porous. This porous silicon is finally oxidized.
机译:对于本发明,提出了一种用于在单晶硅层的表面中产生单晶压阻的方法,该方法通过相对于周围基板的绝缘层而被电绝缘并且因此也在高温范围内进行测量。对于本发明,首先在硅表面的电阻器区域中引入至少一个掺杂。然后,相对于相邻的硅产生掺杂电阻区(21)的电绝缘(23)。为此目的,存在至少一个掺杂电阻区(21),并且在被蚀刻的多孔硅层(10)的掺杂电阻区(21)的延伸区(23)下方。最终该多孔硅被氧化。

著录项

  • 公开/公告号DE102008043084A1

    专利类型

  • 公开/公告日2010-04-29

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE20081043084

  • 发明设计人

    申请日2008-10-22

  • 分类号H01L41/22;H01L41/04;B81B3/00;G01L9/06;H01L21/306;

  • 国家 DE

  • 入库时间 2022-08-21 18:28:46

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