首页> 外国专利> Measuring system has supply station and inspection station for examining article, particularly wafer, where supply station and inspection station are separated from each other

Measuring system has supply station and inspection station for examining article, particularly wafer, where supply station and inspection station are separated from each other

机译:测量系统具有用于检查物品(特别是晶圆)的供应站和检查站,其中供应站和检查站彼此分开

摘要

The measuring system (10) has a supply station (11) and an inspection station (16) for examining an article, particularly a wafer (12), where the supply station and the inspection station are separated from each other. An interface (20) is arranged between the supply station and the inspection station in lockable manner. The interface has a large opening, so that a transportation arm with the wafer reaches through the opening within small tolerances.
机译:测量系统(10)具有供应站(11)和检查站(16),用于检查物品,特别是晶片(12),其中供应站和检查站彼此分开。接口(20)以可锁定的方式布置在供应站和检查站之间。该接口具有较大的开口,因此带有晶片的运输臂在很小的公差范围内穿过该开口。

著录项

  • 公开/公告号DE102008044508A1

    专利类型

  • 公开/公告日2010-03-18

    原文格式PDF

  • 申请/专利权人 VISTEC SEMICONDUCTOR SYSTEMS JENA GMBH;

    申请/专利号DE20081044508

  • 发明设计人 SCHENCK RENE;

    申请日2008-09-09

  • 分类号H01L21/68;G01N21/95;

  • 国家 DE

  • 入库时间 2022-08-21 18:28:45

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