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Transfer device for transferring substrate e.g. microelectronic workpiece, in processing plant, has control units for subjecting transfer chamber to sealed docking position at docking station transverse to lifting direction
Transfer device for transferring substrate e.g. microelectronic workpiece, in processing plant, has control units for subjecting transfer chamber to sealed docking position at docking station transverse to lifting direction
The device has a trolley comprising a transfer chamber (3), which is supported on a chassis by a spring support i.e. suspension strut. The transfer chamber is height adjustable to a docking height of a docking station (2) parallel to the spring support by a lifting device in lifting position. The transfer chamber is subjected by a lifting path to the docking height by the spring support and the lifting device. Control units i.e. control cylinders, subject the transfer chamber to a sealed docking position at the docking station transverse to the lifting direction.
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