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Wear protective layer useful for sliding element, comprises a matrix containing chromium, aluminum, nitrogen, oxygen and/or carbon, where metallic silver is stored in the matrix in the form of a solid solution
Wear protective layer useful for sliding element, comprises a matrix containing chromium, aluminum, nitrogen, oxygen and/or carbon, where metallic silver is stored in the matrix in the form of a solid solution
The wear protective layer (3) comprises a matrix containing chromium (25-45 atom %), aluminum (5-15 atom %), nitrogen (35-55 atom %), oxygen and/or carbon, where metallic silver (2-20 atom %) is stored in the matrix in the form of a solid solution or in the form of a separate phase. The portion of oxygen and/or carbon in the matrix is 5 atom%. The protective layer has a thickness of 5-70 mu m, hardness of 10-16 GPa, and a porosity of 2-15%. The protective layer has a residual stress of greater than 500 N/mm 2at room temperature and exists in the form of a multilayered system. The wear protective layer (3) comprises a matrix containing chromium (25-45 atom %), aluminum (5-15 atom %), nitrogen (35-55 atom %), oxygen and/or carbon, where metallic silver (2-20 atom %) is stored in the matrix in the form of a solid solution or in the form of a separate phase. The portion of oxygen and/or carbon in the matrix is 5 atom%. The protective layer has a thickness of 5-70 mu m, hardness of 10-16 GPa, and a porosity of 2-15%. The protective layer has a residual stress of greater than 500 N/mm 2at room temperature and exists in the form of a multilayered system, which is compounded from a sequence of single layer with different silver contents. The protective layer is produced by a physical vapor deposition. An independent claim is included for a sliding element.
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机译:耐磨保护层(3)包括含有铬(25-45原子%),铝(5-15原子%),氮(35-55原子%),氧和/或碳的基质,其中金属银(2- 20原子%)以固溶体形式或分离相形式存储在基质中。基质中氧和/或碳的部分为5原子%。该保护层的厚度为5-70μm,硬度为10-16GPa,孔隙率为2-15%。该保护层在室温下具有大于500 N / mm 2的残余应力,并且以多层系统的形式存在。耐磨保护层(3)包括含有铬(25-45原子%),铝(5-15原子%),氮(35-55原子%),氧和/或碳的基质,其中金属银(2- 20原子%)以固溶体形式或分离相形式存储在基质中。基质中氧和/或碳的部分为5原子%。该保护层的厚度为5-70μm,硬度为10-16GPa,孔隙率为2-15%。该保护层在室温下具有大于500 N / mm 2的残余应力,并且以多层体系的形式存在,该多层体系由具有不同银含量的单层序列复合而成。通过物理气相沉积来产生保护层。对于滑动元件包括独立权利要求。
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