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Method for adjusting reference component e.g. mirror, of projection lens for semiconductor lithography, involves adjusting reference component of projection lens by auxiliary ring that is temporarily connected with projection lens
Method for adjusting reference component e.g. mirror, of projection lens for semiconductor lithography, involves adjusting reference component of projection lens by auxiliary ring that is temporarily connected with projection lens
The method involves adjusting a reference component of a projection lens by an auxiliary ring (8) and adjustment ring that are temporarily connected with the projection lens. The auxiliary ring is aligned opposite to the projection lens, where the auxiliary ring includes boreholes (6'), a threaded hole, and a mating hole for accommodating the reference component. The reference component is aligned on a reference surface of the adjustment ring after alignment of the adjustment ring. An independent claim is also included for an arrangement of an auxiliary ring for adjusting reference component of a projection lens for semiconductor lithography.
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