首页> 外国专利> Method for adjusting reference component e.g. mirror, of projection lens for semiconductor lithography, involves adjusting reference component of projection lens by auxiliary ring that is temporarily connected with projection lens

Method for adjusting reference component e.g. mirror, of projection lens for semiconductor lithography, involves adjusting reference component of projection lens by auxiliary ring that is temporarily connected with projection lens

机译:调整参考分量的方法,例如用于半导体光刻的投影透镜的反射镜包括通过与投影透镜临时连接的辅助环调整投影透镜的参考组件

摘要

The method involves adjusting a reference component of a projection lens by an auxiliary ring (8) and adjustment ring that are temporarily connected with the projection lens. The auxiliary ring is aligned opposite to the projection lens, where the auxiliary ring includes boreholes (6'), a threaded hole, and a mating hole for accommodating the reference component. The reference component is aligned on a reference surface of the adjustment ring after alignment of the adjustment ring. An independent claim is also included for an arrangement of an auxiliary ring for adjusting reference component of a projection lens for semiconductor lithography.
机译:该方法包括通过与投影透镜临时连接的辅助环(8)和调节环来调整投影透镜的参考分量。辅助环与投影透镜相对地对准,其中,辅助环包括孔(6'),螺纹孔和用于容纳参考部件的配合孔。在调整环对准之后,基准部件在调整环的基准面上对准。还包括用于调节用于半导体光刻的投影透镜的参考分量的辅助环的布置的独立权利要求。

著录项

  • 公开/公告号DE102009013720A1

    专利类型

  • 公开/公告日2010-09-23

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT AG;

    申请/专利号DE20091013720

  • 发明设计人 SCHERLE HANS-JUERGEN;SCHAFF STEFAN;

    申请日2009-03-20

  • 分类号G02B7/00;G03F7/20;

  • 国家 DE

  • 入库时间 2022-08-21 18:28:23

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