Field facet mirror for use in illumination lens in illumination system of projection exposure system, during extreme UV-projection-lithography to manufacture semiconductor chip, has reference bodies arranged in reference levels with vectors

摘要

The mirror (6) has multiple of field facets (15) formed together in a super-imposed manner in an object field of a projection lens of a projection exposure system. The field facets are switchable from a neutral position within a pre-determined tilting angle range into predetermined tiling positions via adjusting elements. The facets are arranged in field facet-groups (19-28). The groups are arranged on reference bodies (29-38), which are arranged in reference levels with normal vectors (40) that are tilted against each other. An independent claim is also included for a method for manufacturing a micro-structured component.